2 Masque Souple

A deep-cleansing mask for an even, refined complexion.
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Gently absorbs any impurities and waste products released during the night. Instantly purifies and refreshes the complexion, providing an especially good base for long-lasting make-up.

Active Ingredients

Ingredients list

  • Ivy extract

    has a positive influence

    on the microcirculation.

  • Strawberry extract

    invigorating and refreshing.

  • Kaolin (natural clay)

    absorbs and cleanses

Aqua (Water) • Kaolin • Propylene Glycol • Glyceryl Stearate • Glycerin • Octyl- Dode Canol • Phenoxyethanol • Allantoin • Chlorphenesin • Methyl Hydroxyethylcellulose • Caprylyl Glycol • Pyridoxine Hcl • Sodium Hydroxide • Silica • Linoleic Acid • Parfum (Fragrance) • Hedera Helix (Ivy) Leaf Extract • Sodium Chloride • Pentylene Glycol • Fragaria Ananassa (Straw- Berry) Fruit Extract • Linolenic Acid • Ci 17200 (Red 33) • Glyoxal.
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Active Ingredients

Application method

Apply a thin, but adequate layer to the face, neck and décolleté every morning. Leave to take effect for 1-3 minutes, then rinse thoroughly with water before continuing with the appropriate Maria Galland care steps.

Tailored treatment

Restore your skin’s natural beauty with a Maria Galland Paris Facial treatment. Find your salon nearby

To complete your ritual...